Research on cross-scale stitching processing using femtosecond laser direct writing integrated with in situ detection

Zhenru Wang; Zhen Yang; Xiuwei Li; Shumin Dong; Kemi Xu; Lirong Qiu; Weiqian Zhao

doi:10.1016/j.optlastec.2025.114147

Research on cross-scale stitching processing using femtosecond laser direct writing integrated with in situ detection

Zhenru Wang
, Zhen Yang
, Xiuwei Li
, Shumin Dong
, Kemi Xu
, Lirong Qiu
, Weiqian Zhao^*

^*此作品的通讯作者

Beijing Institute of Technology

科研成果: 期刊稿件 › 文章 › 同行评审

摘要

Femtosecond laser direct writing (FLDW) serves as a prominent method in the area of micro-nano fabrication. Employing a high numerical aperture objective lens and coordinating galvanometer scanners with translation stages, enables the stitching of samples with cross-scale and large-area features. Errors in the galvanometer scanning optical system and translation stage can significantly impair the quality of the desired micro-structures during cross-scale stitching processing. It is crucial to assess and modify these errors in the FLDW system. Traditional methods require various instruments to measure different types of errors, with each using different references, making them unsuitable for high-precision stitching processing. In this study, we identify errors associated with the galvanometer optical system and the translation stage, which impact the stitching quality of FLDW systems. We propose utilizing critical sites identified by the FLDW technique and acquiring microscopic images of the designated areas using commercial devices. By combining algorithms for extracting image feature points, it not only mitigates the uncertainties linked to manual selection in conventional measurements but also facilitates the precise acquisition of various error values under a consistent reference. Utilizing this technology to calibrate the FLDW system enables the attainment of defect-free femtosecond laser stitching processing. Meanwhile, it inspires the integration of the FLDW system with real-time microscopic stitching measurements on a same platform, which enhances operational convenience and improves manufacturing efficiency for femtosecond laser fabrication. The developed system and method enabled the processing of grid structures and computer-generated holograms characterized by cross-scale and large-area features. Experimental results demonstrate the significant potential for manufacturing large-area micro-nano optical devices.

源语言	英语
文章编号	114147
期刊	Optics and Laser Technology
卷	193
DOI	https://doi.org/10.1016/j.optlastec.2025.114147
出版状态	已出版 - 1月 2026
已对外发布	是

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title = "Research on cross-scale stitching processing using femtosecond laser direct writing integrated with in situ detection",

abstract = "Femtosecond laser direct writing (FLDW) serves as a prominent method in the area of micro-nano fabrication. Employing a high numerical aperture objective lens and coordinating galvanometer scanners with translation stages, enables the stitching of samples with cross-scale and large-area features. Errors in the galvanometer scanning optical system and translation stage can significantly impair the quality of the desired micro-structures during cross-scale stitching processing. It is crucial to assess and modify these errors in the FLDW system. Traditional methods require various instruments to measure different types of errors, with each using different references, making them unsuitable for high-precision stitching processing. In this study, we identify errors associated with the galvanometer optical system and the translation stage, which impact the stitching quality of FLDW systems. We propose utilizing critical sites identified by the FLDW technique and acquiring microscopic images of the designated areas using commercial devices. By combining algorithms for extracting image feature points, it not only mitigates the uncertainties linked to manual selection in conventional measurements but also facilitates the precise acquisition of various error values under a consistent reference. Utilizing this technology to calibrate the FLDW system enables the attainment of defect-free femtosecond laser stitching processing. Meanwhile, it inspires the integration of the FLDW system with real-time microscopic stitching measurements on a same platform, which enhances operational convenience and improves manufacturing efficiency for femtosecond laser fabrication. The developed system and method enabled the processing of grid structures and computer-generated holograms characterized by cross-scale and large-area features. Experimental results demonstrate the significant potential for manufacturing large-area micro-nano optical devices.",

keywords = "Cross scale processing, Error measurement and calibration, In situ detection, Laser direct writing, Stitching processing",

author = "Zhenru Wang and Zhen Yang and Xiuwei Li and Shumin Dong and Kemi Xu and Lirong Qiu and Weiqian Zhao",

note = "Publisher Copyright: {\textcopyright} 2025",

year = "2026",

month = jan,

doi = "10.1016/j.optlastec.2025.114147",

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journal = "Optics and Laser Technology",

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T1 - Research on cross-scale stitching processing using femtosecond laser direct writing integrated with in situ detection

AU - Wang, Zhenru

AU - Yang, Zhen

AU - Li, Xiuwei

AU - Dong, Shumin

AU - Xu, Kemi

AU - Qiu, Lirong

AU - Zhao, Weiqian

PY - 2026/1

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N2 - Femtosecond laser direct writing (FLDW) serves as a prominent method in the area of micro-nano fabrication. Employing a high numerical aperture objective lens and coordinating galvanometer scanners with translation stages, enables the stitching of samples with cross-scale and large-area features. Errors in the galvanometer scanning optical system and translation stage can significantly impair the quality of the desired micro-structures during cross-scale stitching processing. It is crucial to assess and modify these errors in the FLDW system. Traditional methods require various instruments to measure different types of errors, with each using different references, making them unsuitable for high-precision stitching processing. In this study, we identify errors associated with the galvanometer optical system and the translation stage, which impact the stitching quality of FLDW systems. We propose utilizing critical sites identified by the FLDW technique and acquiring microscopic images of the designated areas using commercial devices. By combining algorithms for extracting image feature points, it not only mitigates the uncertainties linked to manual selection in conventional measurements but also facilitates the precise acquisition of various error values under a consistent reference. Utilizing this technology to calibrate the FLDW system enables the attainment of defect-free femtosecond laser stitching processing. Meanwhile, it inspires the integration of the FLDW system with real-time microscopic stitching measurements on a same platform, which enhances operational convenience and improves manufacturing efficiency for femtosecond laser fabrication. The developed system and method enabled the processing of grid structures and computer-generated holograms characterized by cross-scale and large-area features. Experimental results demonstrate the significant potential for manufacturing large-area micro-nano optical devices.

AB - Femtosecond laser direct writing (FLDW) serves as a prominent method in the area of micro-nano fabrication. Employing a high numerical aperture objective lens and coordinating galvanometer scanners with translation stages, enables the stitching of samples with cross-scale and large-area features. Errors in the galvanometer scanning optical system and translation stage can significantly impair the quality of the desired micro-structures during cross-scale stitching processing. It is crucial to assess and modify these errors in the FLDW system. Traditional methods require various instruments to measure different types of errors, with each using different references, making them unsuitable for high-precision stitching processing. In this study, we identify errors associated with the galvanometer optical system and the translation stage, which impact the stitching quality of FLDW systems. We propose utilizing critical sites identified by the FLDW technique and acquiring microscopic images of the designated areas using commercial devices. By combining algorithms for extracting image feature points, it not only mitigates the uncertainties linked to manual selection in conventional measurements but also facilitates the precise acquisition of various error values under a consistent reference. Utilizing this technology to calibrate the FLDW system enables the attainment of defect-free femtosecond laser stitching processing. Meanwhile, it inspires the integration of the FLDW system with real-time microscopic stitching measurements on a same platform, which enhances operational convenience and improves manufacturing efficiency for femtosecond laser fabrication. The developed system and method enabled the processing of grid structures and computer-generated holograms characterized by cross-scale and large-area features. Experimental results demonstrate the significant potential for manufacturing large-area micro-nano optical devices.

KW - Cross scale processing

KW - Error measurement and calibration

KW - In situ detection

KW - Laser direct writing

KW - Stitching processing

UR - https://www.scopus.com/pages/publications/105021853892

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DO - 10.1016/j.optlastec.2025.114147

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SN - 0030-3992

VL - 193

JO - Optics and Laser Technology

JF - Optics and Laser Technology

M1 - 114147

ER -

Research on cross-scale stitching processing using femtosecond laser direct writing integrated with in situ detection

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